Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications (Q92943611)
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scientific article published on 19 March 2019
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications |
scientific article published on 19 March 2019 |
Statements
Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications (English)
Roman Elashnikov
Jaromír Háša
Lukáš Děkanovský
Jaroslav Otta
Přemysl Fitl
Václav Švorčík