Reducing surface area while maintaining implant penetrating profile lowers the brain foreign body response to chronically implanted planar silicon microelectrode arrays (Q48933034)
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scientific article published on January 1, 2011
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English | Reducing surface area while maintaining implant penetrating profile lowers the brain foreign body response to chronically implanted planar silicon microelectrode arrays |
scientific article published on January 1, 2011 |
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Reducing surface area while maintaining implant penetrating profile lowers the brain foreign body response to chronically implanted planar silicon microelectrode arrays (English)
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Kensall D Wise
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Sr Mary Elizabeth Merriam
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Onnap Srivannavit
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Gaytri Perlin
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John L. Skousen
Patrick A. Tresco
1 January 2011
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194
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167-180
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