Jump to content

10 µm process

From Wikipedia, the free encyclopedia
(Redirected from 10 μm process)

The 10 μm process (10 micrometer process) is the level of MOSFET semiconductor process technology that was commercially reached around 1971,[1][2] by companies such as RCA and Intel.

The 10 μm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 10 micrometers wide.

Products featuring 10 μm manufacturing process

[edit]

References

[edit]
  1. ^ Mueller, S (21 July 2006). "Microprocessors from 1971 to the Present". informIT. Retrieved 11 May 2012.
  2. ^ Myslewski, R (15 November 2011). "Happy 40th birthday, Intel 4004!". TheRegister. Archived from the original on 19 April 2015. Retrieved 19 April 2015.
  3. ^ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. p. 330. ISBN 9783540342588.
  4. ^ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. pp. 362–363. ISBN 9783540342588. The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm2, and sold for around $21.
  5. ^ a b "History of the Intel Microprocessor - Listoid". Archived from the original on 27 April 2015. Retrieved 19 April 2015.
[edit]
Preceded by
20 μm process
MOSFET semiconductor device fabrication process Succeeded by
6 μm process