File:Pulsed Laser Deposition in Action.jpg

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English: Thin films of oxides are deposited with atomic layer precision using pulsed laser deposition. A high-intensity pulsed laser is shooting onto the rotating white target consisting of Al2O3 (alumina). The laser pulse creates a plasma explosion visible as the purple cloud. The plasma cloud expands towards the square substrate, consisting of SrTiO3 (strontium titanate), where it deposits thin layers of alumina, one atomic layer at a time. This results in a conducting interface between the two materials which are otherwise insulating. The substrate is mounted on a heating plate, glowing red from a temperature of 650 ºC, to improve the crystallinity of the alumina thin film.
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Author Adam Andersen Læssøe

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current07:32, 30 November 2015Thumbnail for version as of 07:32, 30 November 20152,782 × 3,952 (4.22 MB)Aalasso (talk | contribs)User created page with UploadWizard

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